Company Filing History:
2 out of 371 
1 out of 29,279 
Years Active: 1990-2004
Title: Helmut Endl: Innovator in Semiconductor Technology
Introduction
Helmut Endl is a notable inventor based in Freising, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for applying materials to semiconductor wafers and enhancing the etching processes of thin films.
Latest Patents
One of Helmut Endl's latest patents is a cathodic sputtering chamber designed for applying material to the surface of a semiconductor wafer. This chamber features a movable wafer mount that allows for precise positioning of the semiconductor wafer during the sputtering process. The design includes a shielding support that maintains the wafer's contact with the mount while defining a sputtering space between the target and the wafer.
Another significant patent is an apparatus for wet etching of thin films. This apparatus achieves remarkable etching rate uniformity, with differences as low as 5% across various regions of a thin film. It includes a liquid treatment chamber and a rotational-symmetrical basket for accommodating semiconductor slices. The design ensures that the etching solution is applied uniformly, making it suitable for wet etching aluminum layers in device fabrication.
Career Highlights
Helmut Endl has worked with prominent companies in the semiconductor industry, including Texas Instruments Incorporated Deutschland, GmbH and Texas Instruments Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.
Collaborations
Throughout his career, Helmut Endl has collaborated with notable colleagues such as Helmut Rinck and Hermann Bichler. These collaborations have likely fostered an environment of innovation and shared knowledge in the field of semiconductor technology.
Conclusion
Helmut Endl's contributions to semiconductor technology through his patents and career experiences highlight his role as an influential inventor. His innovative approaches to sputtering and etching processes continue to impact the industry positively.