Dresden, Germany

Heinrich Grüger

This inventor holds 1 USPTO granted patent. Top assignee: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heinrich Grüger. Retrieved from https://idiyas.com/inventor/heinrich-grüger

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Heinrich Grüger: Innovator in Ion-Sensitive Technology

Introduction

Heinrich Grüger is a notable inventor based in Dresden, Germany. He is recognized for his contributions to the field of ion-sensitive technology, particularly through his innovative patent related to ion-sensitive field effect transistors.

Latest Patents

Grüger holds a patent for an ion-sensitive field effect transistor and the method for producing it. This invention features a gate made of metal silicate, which provides high resistance to aggressive measured substances and ensures high long-term stability. The design allows for a single layer gate that is arranged directly on the channel region, enhancing its functionality and durability.

Career Highlights

Heinrich Grüger is associated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., a leading research organization in applied sciences. His work has significantly advanced the understanding and application of ion-sensitive technologies in various fields.

Collaborations

Grüger has collaborated with esteemed colleagues such as Eberhard Kurth and Christian Kunath, contributing to the development of innovative solutions in his area of expertise.

Conclusion

Heinrich Grüger's work in ion-sensitive field effect transistors exemplifies the impact of innovative thinking in technology. His contributions continue to influence advancements in the field, showcasing the importance of research and collaboration in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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