Yongin, South Korea

Heetaek Lim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Sdi., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heetaek Lim. Retrieved from https://idiyas.com/inventor/heetaek-lim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Heetaek Lim: Innovator in Clearance Measurement Technology

Introduction

Heetaek Lim is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of measurement technology, particularly with his innovative clearance measuring apparatus. His work exemplifies the intersection of engineering and technology, showcasing the potential for advancements in manufacturing processes.

Latest Patents

Heetaek Lim holds a patent for a clearance measuring apparatus. This invention includes an image sensor integrated into a mold that features a frame, a punch, and a die. The image sensor captures images of the space between the punch and the die, while a controller measures the clearance based on the captured images. This technology enhances precision in manufacturing and quality control.

Career Highlights

Heetaek Lim is currently employed at Samsung SDI, Ltd., where he continues to innovate and develop new technologies. His work at this leading company in the electronics sector allows him to contribute to cutting-edge advancements in the industry.

Collaborations

Heetaek Lim has collaborated with talented coworkers, including Yongseung Shin and Joonkil Kim. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Heetaek Lim's contributions to clearance measurement technology reflect his dedication to innovation and excellence. His patent and work at Samsung SDI, Ltd. highlight the importance of precision in manufacturing processes. His achievements serve as an inspiration for future inventors in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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