Suwon, South Korea

Heesu Chung

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heesu Chung. Retrieved from https://idiyas.com/inventor/heesu-chung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Heesu Chung: Semiconductor Inspection Innovation.

Introduction

Heesu Chung is an inventor based in Suwon, South Korea, associated with Samsung Electronics. His patent work focuses on inspecting semiconductor devices and assessing test-wafer characteristics.

Latest Patents

Chung is named on 1 patent, titled “Inspection Apparatus for Semiconductor Device.” The invention describes an apparatus with a chamber and a substrate stage for loading a test wafer containing multiple wiring layers. A milling device partially removes material from the wafer, while a measuring device directs light onto it through an optical assembly containing filters and a splitter. A polarization camera receives reflected light and measures its polarization characteristics and the wafer’s uniformity.

Career Highlights

Chung’s patent reflects work on optical inspection methods for semiconductor test wafers. By combining partial wafer milling with polarization-based measurement, the apparatus is designed to examine wafer properties relevant to semiconductor-device inspection.

Collaborations

Chung’s listed coworkers include Jubok Lee and Soonyang Kwon. His patent is associated with Samsung Electronics.

Conclusion

Heesu Chung’s patent documents an approach to semiconductor inspection that combines wafer preparation, optical measurement, and polarization imaging.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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