Daejeon, South Korea

Hee Wang Yang

This inventor holds 7 USPTO granted patents and 1 published patent application and 4 EPO patents. Top assignee: Lg Chem, Ltd. Active years: 2020-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee Wang Yang. Retrieved from https://idiyas.com/inventor/hee-wang-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2020-2024

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7 patents (USPTO):Explore Patents

Title: Hee Wang Yang: Innovator in Barrier Film Technology

Introduction

Hee Wang Yang is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of barrier film technology, particularly in applications for electronic products. With a total of 7 patents to his name, Yang continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents, Yang has developed a barrier film designed to protect electronic products that are sensitive to moisture. This innovative barrier film is crucial for enhancing the durability and reliability of various electronic devices. His work in this area demonstrates a commitment to improving product performance and longevity.

Career Highlights

Hee Wang Yang is currently employed at LG Chem, Ltd., a leading company in the chemical industry. His role at LG Chem allows him to collaborate with other talented professionals and contribute to groundbreaking advancements in material science.

Collaborations

Yang has worked alongside notable colleagues, including Jang Yeon Hwang and Sung Jin Shin. Their collaborative efforts have led to the development of innovative solutions in barrier film technology.

Conclusion

Hee Wang Yang's contributions to barrier film technology exemplify his dedication to innovation and excellence. His work not only enhances electronic products but also sets a standard for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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