Heath B DeShong

Title: Heath B DeShong: Innovator in Semiconductor Processing Technology

Introduction

Heath B DeShong is a notable inventor based in Livermore, CA (US). He has made significant contributions to the field of semiconductor processing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of cleaning semiconductor processing equipment.

Latest Patents

Heath B DeShong holds a patent for "Enhanced remote plasma cleaning - Methods and apparatus for cleaning semiconductor processing equipment." This patent describes an apparatus that includes both local and remote gas dissociators coupled to a semiconductor processing chamber. The methods outlined in the patent involve introducing a precursor gas into the remote dissociator, where the gas is dissociated. A portion of the dissociated gas is then introduced into the chamber, while another portion that re-associates before introduction is also introduced into the chamber for further dissociation. The dissociated gas effectively combines with contaminants in the chamber and is exhausted along with these contaminants.

Career Highlights

Heath B DeShong is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to focus on advancing technologies that improve semiconductor manufacturing processes.

Collaborations

Heath has collaborated with notable colleagues such as Thomas E Nowak and Ian Scot Latchford. These collaborations have contributed to the development of innovative solutions in the semiconductor field.

Conclusion

Heath B DeShong's contributions to semiconductor processing technology through his patent demonstrate his commitment to innovation in the industry. His work continues to influence the efficiency of semiconductor manufacturing processes.