Applied Materials, Inc.

Heath B DeShong

Thomas E Nowak

Tsutomu Tanaka

Martin Jay Seamons

Ping Xu

Ian Scot Latchford

Jason K Foster

Bok Heon Kim

Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociator where the gas is dissociated and introducing a portion of the dissociated gas into the chamber. Another portion of the dissociated gas which re-associates before introduction into the chamber is also introduced into the chamber where it is again dissociated. The dissociated gas combines with contaminants in the chamber and is exhausted from the chamber along with the contaminants.

Enhanced remote plasma cleaning

Growing community of inventors

Livermore, CA, United States of America

Heath B DeShong