Company Filing History:
Years Active: 2022-2025
Title: He Zuopeng: Innovator in Semiconductor Technology
Introduction
He Zuopeng is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor technology. With a total of 2 patents, he has made significant advancements in methods for forming semiconductor structures. His work addresses critical challenges in the semiconductor manufacturing process.
Latest Patents
He Zuopeng's latest patents include a method for forming a semiconductor structure. This method involves providing a base and forming a pattern memory layer on it, which includes at least a first trench and a second trench. The trenches are created using different masks, ensuring that their extending directions are parallel. This innovative approach helps avoid issues such as photoresist peeling during etching. Another notable patent is for a semiconductor structure and its forming method, which enhances the accuracy of pattern transfer by utilizing discrete mandrel layers and spacer layers.
Career Highlights
Throughout his career, He Zuopeng has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies.
Collaborations
He has collaborated with several professionals in the field, including Yang Ming and Bei Duohui. These collaborations have further enriched his work and innovations in semiconductor manufacturing.
Conclusion
He Zuopeng's contributions to semiconductor technology through his patents and career experiences highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.