Company Filing History:
Years Active: 2017-2019
Title: Hayato Hishinuma: Innovator in Plasma Processing Technology
Introduction
Hayato Hishinuma is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on innovative etching methods that enhance substrate processing.
Latest Patents
Hishinuma's latest patents include an etching method and a plasma processing apparatus. The first patent describes an etching method for processing a substrate with a first region that has an insulating film on a silicon layer and a second region with an insulating film on a metal layer. This method involves a two-step process: the first step etches the insulating film into a predetermined pattern using plasma from a first gas, exposing both the silicon and metal layers. The second step further etches the silicon layer using plasma generated from a second gas that includes a bromide-containing gas.
The second patent discloses a method for etching a first region that includes a multi-layer film of alternating silicon oxide and silicon nitride films, alongside a second region with a single silicon oxide film. This method involves providing a processing target object with a mask on both regions within a plasma processing apparatus. Plasma is generated from a first processing gas that includes a hydrofluorocarbon gas, followed by plasma from a second processing gas that includes a fluorocarbon gas. The steps of generating plasma from both gases are alternately repeated to achieve the desired etching results.
Career Highlights
Hishinuma is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative etching techniques, contributing to advancements in semiconductor technology.
Collaborations
Hishinuma has collaborated with notable coworkers, including Yusuke Saitoh and Yu Nagatomo. Their combined expertise has fostered a productive environment for innovation and development in plasma processing technologies.
Conclusion
Hayato Hishinuma's contributions to plasma processing technology through his innovative patents and work at Tokyo Electron Limited highlight his role as a key inventor in the field. His advancements in etching methods continue to influence the semiconductor industry.