Hitachi, Japan

Hauro Akahoshi

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hauro Akahoshi. Retrieved from https://idiyas.com/inventor/hauro-akahoshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hauro Akahoshi

Introduction

Hauro Akahoshi is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of electrochemical measurement. His work focuses on improving the long-term stability of analysis data through innovative electrode designs.

Latest Patents

Hauro Akahoshi holds a patent for an "Electrode for electrochemical measurement, electrolysis cell for electrochemical measurement, analyzer for electrochemical measurement, and methods for producing same." This invention provides an electrode, an electrolysis cell, and an electrochemical analyzer that enhance the reliability of analysis data over extended periods. The working electrode is crafted from a composite material that includes platinum or a platinum alloy, with a specific metal oxide content to optimize performance.

Career Highlights

Hauro Akahoshi is associated with Hitachi High-Technologies Corporation, where he has been instrumental in advancing electrochemical technologies. His innovative approaches have led to the development of more efficient and stable measurement systems.

Collaborations

He has collaborated with notable colleagues such as Hiroshi Yoshida and Hiroshi Kanemoto, contributing to various projects that enhance the capabilities of electrochemical analysis.

Conclusion

Hauro Akahoshi's work exemplifies the intersection of innovation and practical application in the field of electrochemical measurement. His contributions continue to influence advancements in technology and analysis methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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