Haruo Kokubo

Title: Haruo Kokubo: Innovator in Photomask Technology

Introduction

Haruo Kokubo is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on methods that enhance the manufacturing processes of phase shift masks, which are crucial in the semiconductor industry.

Latest Patents

Kokubo's latest patents include innovative methods for manufacturing phase shift masks. One notable patent describes methods of manufacturing phase shift masks that feature etched substrate shifters with rounded sidewalls at the top and bottom corners. This method involves forming a resist pattern with selective openings at the shifter part, creating a dug-down part corresponding to the shifter, and applying wet etching to achieve the desired substrate shape. Another patent focuses on halftone phase shift photomasks, which are designed to maintain precise transmittance levels at specific wavelengths. This invention ensures high-quality photomasks that can be reliably used in inspection and measuring equipment.

Career Highlights

Kokubo is currently employed at Dai Nippon Printing Co., Ltd., a leading company in the printing and imaging industry. His role involves developing advanced photomask technologies that are essential for modern semiconductor fabrication. His expertise in this area has positioned him as a key figure in the field.

Collaborations

Throughout his career, Kokubo has collaborated with notable colleagues, including Takafumi Okamura and Toshifumi Yokoyama. These collaborations have furthered the development of innovative solutions in photomask technology.

Conclusion

Haruo Kokubo's contributions to photomask technology through his patents and work at Dai Nippon Printing Co., Ltd. highlight his importance in the semiconductor industry. His innovative methods continue to influence the manufacturing processes of essential components in modern electronics.