The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Feb. 15, 2002
Haruo Kokubo, Tokyo-to, JP;
Haruo Kokubo, Tokyo-to, JP;
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Abstract
Methods of manufacturing a single sided engraving phase shift mask that includes a shifter part and a non-shifter part mutually adjacent on a substrate, and a shading layer pattern formed with a shading film and wherein a side wall part of a dug-down part has round, crooked portions at top and bottom corners of the sidewall part. The method includes forming a resist pattern having a selective opening at the shifter part, forming a dug-down part corresponding to the shifter part by using the resist pattern, wet etching the whole surface at the dug-down part forming side of the substrate, forming a shading film on the substrate, forming a resist pattern on the shading film, and forming a shading pattern having prescribed openings at the shifter part and non-shifter part.