Haruki Sonoda

Title: Haruki Sonoda: Innovator in Wafer Cleaning Technology

Introduction

Haruki Sonoda is a notable inventor based in Shizuoka-ken, Japan. He has made significant contributions to the field of wafer cleaning technology, holding 2 patents that showcase his innovative approach to improving cleaning processes for workpieces.

Latest Patents

Sonoda's latest patents include a "Wafer cleaning device and tray for use in wafer cleaning device" and a "Multi-step flow cleaning method and multi-step flow cleaning apparatus." The wafer cleaning device features a band-shaped tray with grasping grooves for handling wafers, along with a cleaning tank designed to effectively clean the wafers using a conveyor robot. The cleaning tank is equipped with guides for tray mounting, a V-shaped bottom to conform to the wafer's shape, and flow ports for cleaning fluid. Additionally, the overflow tank is designed to manage excess cleaning fluid, ensuring efficient operation.

The multi-step flow cleaning method and apparatus aim to enhance the cleaning of workpieces by utilizing a stream of cleaning solution while minimizing foreign matter accumulation on surfaces. This system includes a cleaning tank, a supply line for delivering cleaning solutions, and a valve that regulates the flow of the solution. The innovative design allows for two-step adjustments in the supply flow, optimizing the cleaning process.

Career Highlights

Haruki Sonoda has established himself as a key figure in the field of wafer cleaning technology through his work at Spc Electronics Corporation. His expertise and innovative mindset have led to the development of advanced cleaning solutions that are crucial for maintaining the quality of semiconductor manufacturing.

Collaborations

Sonoda collaborates with talented individuals such as Tetsuji Oishi and Masatoshi Hirokawa, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Haruki Sonoda's contributions to wafer cleaning technology reflect his dedication to innovation and excellence. His patents not only enhance cleaning processes but also demonstrate the potential for advancements in semiconductor manufacturing.