Troy, MI, United States of America

Harry W Hsieh

This inventor holds 24 USPTO granted patents and 3 EPO patents, primarily in Polyurethane Adhesives. Top assignees: Essex Specialty Products Inc., Dow Global Technolgoies LLC, The Dow Chemical Company. Active years: 1982-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harry W Hsieh. Retrieved from https://idiyas.com/inventor/harry-w-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 87.5


Average Co-Inventor Count = 2.1

ph-index = 17

Forward Citations = 849(Granted Patents)


Location History:

  • Rahway, NJ (US) (1982 - 1988)
  • Edison, NJ (US) (1986 - 1993)
  • Troy, MI (US) (1995 - 2010)

Company Filing History:


Years Active: 1982-2010

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Areas of Expertise:
Polyurethane Adhesives
Bonding Methods
Sealant Compositions
Silane Functional Adhesives
Cure on Demand Adhesives
Moisture Curable Polymers
High Speed Cure Sealant
Acrylic Resin
24 patents (USPTO):Explore Patents

Title: Inventor Harry W Hsieh - Pioneering Innovations in Troy, MI

Introduction: Harry W Hsieh is a renowned inventor based in Troy, Michigan, known for his groundbreaking contributions to the field of technology and engineering.

Latest Patents: Harry W Hsieh holds several patents in various technological domains, including advancements in renewable energy systems, smart home devices, and automotive safety technologies.

Career Highlights: With a career spanning over two decades, Harry W Hsieh has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Harry W Hsieh has collaborated with top engineers, scientists, and designers to bring his innovative ideas to life. His partnerships have resulted in the successful commercialization of numerous inventions.

Conclusion: Harry W Hsieh's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and engineers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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