Harry W Conard

Title: **The Innovative Contributions of Harry W Conard**

Introduction: Harry W Conard, based in Orient, Ohio, is a notable inventor with an impressive portfolio of five patents. His inventive efforts have significantly influenced the field of plasma vapor deposition technologies. With a keen focus on improving performance and efficiency, Conard's work exemplifies the spirit of innovation in engineering.

Latest Patents: Harry W Conard's latest patents include groundbreaking designs that enhance sputtering processes. One of his prominent patents discusses a sputtering target with an insulating ring and a gap between the ring and the target. This innovative design improves the interface between PVD targets, ceramic rings, and chamber walls, thereby optimizing sputtering plasma reactors. It features a vacuum chamber formed by a PVD target and chamber wall, incorporating an insulating ceramic ring that maintains critical vacuum seals through a strategic use of O-rings. The incorporation of a spacer made of low-friction materials further prevents interface damage, ensuring longevity and reliability.

In addition to this, Conard has developed a friction fit target assembly for high power sputtering operations. This patent addresses the challenges associated with dissimilar thermal coefficients of expansion in sputter target and backing plate assemblies. His innovative bonding methods allow for high-temperature operations without compromising structural integrity, enabling the use of backing plates suitable for various target metals.

Career Highlights: Conard's contributions to the industry are embodied in his work at Tosoh Smd, Inc. Here, he continues to push the boundaries of technology with an emphasis on developing efficient sputtering solutions. His patent portfolio reflects his commitment to advancing manufacturing processes and enhancing the capabilities of sputtering machinery.

Collaborations: Throughout his career, Harry W Conard has collaborated with esteemed colleagues such as Eugene Y Ivanov and Sohail S Qamar. These partnerships have brought together diverse expertise and perspectives, fostering an environment of creativity and groundbreaking technological advancements.

Conclusion: Harry W Conard's innovative spirit and significant contributions to the field of plasma vapor deposition have marked him as a noteworthy inventor. His pioneering patents and collaborations at Tosoh Smd, Inc. highlight his dedication to improving industrial processes and technology. Through his work, Conard continues to inspire future generations of inventors and engineers.