Company Filing History:
7 out of 2,085 
1 out of 1,381 
Years Active: 1999-2008
Title: The Innovative Journey of Harry P Gillis
Introduction: Harry P Gillis, an accomplished inventor based in Los Angeles, California, stands out in the field of technology and innovation with a portfolio of eight patents. His contributions to the industry highlight his expertise and dedication to advancing methodologies in substrate etching technology.
Latest Patents: Among his most notable work is a recent patent titled "Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment." This invention introduces an apparatus designed for low-damage, anisotropic etching of substrates. The unique design features a mechanical support for the substrate, located within an AC or DC plasma reactor. This mechanical support operates independently of the plasma reactor and is capable of being electrically biased. By employing a plasma of low-energy electrons alongside a reactive species, his apparatus enables advanced control over the etching process. Additionally, an electrically biased structure can be integrated within the plasma to further manage the extraction or retardation of particles.
Career Highlights: Throughout his career, Harry has worked with esteemed organizations such as the Georgia Tech Research Corporation and the University of Colorado. His experience at these institutions has equipped him with invaluable skills and insights that have propelled his innovations to the forefront of the field.
Collaborations: Harry's journey has also been marked by significant collaborations. He has worked alongside talented individuals like Kevin P Martin and Dmitri A Choutov, further enhancing the scope and impact of his inventions. These collaborations reflect a shared commitment to excellence in research and development.
Conclusion: Harry P Gillis continues to shape the landscape of technological innovation through his inventive spirit and dedication to his craft. With a strong foundation in substrate etching technology, he remains a prominent figure whose work is anticipated to influence future developments in the field. His legacy as an inventor is underpinned by a robust portfolio of patents and collaborative efforts that emphasize the importance of innovation in our modern world.