Walden, NY, United States of America

Harry D Clark

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harry D Clark. Retrieved from https://idiyas.com/inventor/harry-d-clark

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Harry D Clark

Introduction

Harry D Clark is an accomplished inventor based in Walden, NY (US). He has made significant contributions to the field of alarm classification systems, particularly in the context of wafer processing. His innovative approach addresses critical issues related to contamination, process variability, and equipment malfunction.

Latest Patents

Harry D Clark holds a patent for a "Real time alarm classification and method of use." This patent describes a real-time alarm classification system designed to identify specific root causes of abnormal conditions. The system utilizes a computer infrastructure to generate top contributors associated with alarms triggered by sensed abnormal conditions. It compares these contributors to historic residual gas analyzer (RGA) alarms of known root causes, providing a probable root cause when a match is found.

Career Highlights

Harry D Clark is associated with International Business Machines Corporation (IBM), where he has been instrumental in developing advanced technologies. His work focuses on enhancing the reliability and efficiency of processes in wafer manufacturing.

Collaborations

Some of his notable coworkers include Joseph Byrne and Gary R Moore, who have collaborated with him on various projects within the company.

Conclusion

Harry D Clark's innovative contributions to alarm classification systems have made a significant impact in the field of wafer processing. His work continues to influence advancements in technology and process optimization.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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