This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Innovations by Harrison Chin in Electron Beam Assisted Etching
Introduction
Harrison Chin is an accomplished inventor based in Bedford, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes. His innovative approach has led to the development of methods that enhance the efficiency and precision of etching materials at low temperatures.
Latest Patents
Harrison Chin holds 1 patent for his invention titled "Methods and apparatus for electron beam assisted etching at low temperatures." This patent discloses methods and apparatus for etching a sample, such as a semiconductor device or wafer. The invention allows for dry etching of materials, such as copper, at room temperature using a reactive substance, like a chlorine-based gas. The mechanisms of this invention enable precise etching of copper materials to produce fine feature patterns without the need to heat the entire device or substrate to elevated temperatures. The etching process is enhanced by simultaneously scanning a charged particle beam, such as an electron beam, and a photon beam, such as a laser beam, over the same target area while introducing the reactive substance.
Career Highlights
Harrison Chin is currently employed at Kla Tencor Corporation, where he continues to innovate in the field of semiconductor manufacturing. His work focuses on improving etching techniques that are crucial for the production of advanced electronic devices.
Collaborations
Harrison has collaborated with notable colleagues, including Anne Testoni and Mehran Nasser-Ghodsi, who contribute to the innovative environment at Kla Tencor Corporation.
Conclusion
Harrison Chin's contributions to the field of semiconductor technology through his innovative patent on electron beam assisted etching demonstrate his commitment to advancing manufacturing processes. His work not only enhances the precision of etching but also contributes to the efficiency of semiconductor device production.