Harold R Shurtleff

Title: Harold R. Shurtleff: Innovator in Wafer Cleaning Technology

Introduction

Harold R. Shurtleff is a notable inventor based in Buzzards Bay, MA (US). He has made significant contributions to the field of wafer cleaning technology. His innovative approach has led to the development of a unique apparatus and method for cleaning wafers.

Latest Patents

Harold R. Shurtleff holds 1 patent for his invention titled "Apparatus and method for cleaning wafers." This patent describes a system in which thin, disc-like wafers are moved in an arcuate path while being supported in an upright position. The wafers are indexed between multiple cleaning stations, including a scrub station, a scrub rinse station, a rinse station, and a dry station. In the scrub rinse and scrub station, the wafers are rotated while being contacted on opposite surfaces by a pair of rotating brushes. These brushes can be moved to an open position to allow the wafers to pass through. Additionally, a uniquely constructed bracket serially moves the wafers into the travel path, and there are means for introducing and removing the wafers from the path.

Career Highlights

Harold R. Shurtleff is associated with Huestis Machine Corporation, where he has applied his expertise in wafer cleaning technology. His work has contributed to advancements in the manufacturing processes of semiconductor devices.

Collaborations

Some of his notable coworkers include Jeffrey L. Dexter and William E. Fairweather. Their collaboration has likely fostered an environment of innovation and development within their projects.

Conclusion

Harold R. Shurtleff's contributions to wafer cleaning technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving manufacturing processes, showcasing the importance of invention in the tech industry.