The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1980
Filed:
Dec. 19, 1977
Jeffrey L Dexter, North Dartmouth, MA (US);
William E Fairweather, Mattapoisett, MA (US);
Harold R Shurtleff, Buzzards Bay, MA (US);
Huestis Machine Corp., Bristol, RI (US);
Abstract
Apparatus and method in which a number of thin, disc-like wafers are moved in an arcuate path while supported in a generally upright position. While so supported, the wafers are indexed between a plurality of cleaning stations which may include a scrub station, a scrub rinse station, a rinse station, and a dry station. In the scrub rinse and/or scrub station, the wafers are rotated while contacted on opposite surfaces thereof by a pair of rotating brushes disposed in a closed position, which brushes may be moved to an open position to accommodate movement of the wafers therebetween. Furthermore, a bracket of unique construction serially moves the wafers into the travel path. Means for introducing the wafers to the path and for removing them therefrom are further included.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile