Harmut Enkisch

Title: Harmut Enkisch: Innovator in Microlithography

Introduction

Harmut Enkisch is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative patent related to projection objectives.

Latest Patents

Enkisch holds a patent for a "Projection objective and method for its manufacture." This invention outlines a method for manufacturing a projection objective used in microlithographic projection exposure apparatuses. The projection objective includes at least one mirror that has a mirror support and a reflective coating applied to it. The process involves measuring first imaging aberrations of a pre-assembled projection objective. Before applying the coating, the mirror supports are designed with a desired surface deformation. If the mirrors are not reflective for projection light without the coating, measuring light of a different wavelength is utilized. Alternatively, two identical mirror supports may be used, with one support having a reflective coating as part of the pre-assembled objective.

Career Highlights

Harmut Enkisch is associated with Carl Zeiss SMT GmbH, a leading company in optical systems and solutions. His work has been instrumental in advancing technologies that are crucial for the semiconductor industry.

Collaborations

Enkisch has collaborated with notable colleagues such as Hans-Juergen Mann and Stephan Muellender, contributing to various projects that enhance the capabilities of microlithographic systems.

Conclusion

Harmut Enkisch's innovative work in the field of microlithography exemplifies the importance of advancements in optical technologies. His contributions continue to influence the industry and pave the way for future innovations.