Harlan Stamper

Title: Harlan Stamper: Innovator in Etching and Patterning Technologies

Introduction

Harlan Stamper is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of etching and patterning technologies, holding a total of 2 patents. His innovative methods have advanced the capabilities of substrate processing in various applications.

Latest Patents

Stamper's latest patents include a "Method for etching using a multi-layer mask" and a "Method of forming a dual damascene structure utilizing a developable anti-reflective coating." The first patent describes a method of dry developing a multi-layer mask on a substrate, which involves forming a lithographic layer over a second mask layer. This process allows for the transfer of a feature pattern from the lithographic layer to the second mask layer using a dry plasma etching process. The second patent outlines a method of patterning a structure in a thin film on a substrate, which includes the use of a developable anti-reflective coating and multiple photo-resist layers to achieve precise pattern transfers.

Career Highlights

Throughout his career, Harlan Stamper has worked with prominent companies such as Tokyo Electron Limited. His experience in the semiconductor industry has equipped him with the skills necessary to innovate in the field of etching and patterning technologies.

Collaborations

Stamper has collaborated with notable colleagues, including Shannon W. Dunn and Sandra L. Hyland. These partnerships have contributed to his success and the advancement of his inventions.

Conclusion

Harlan Stamper's contributions to etching and patterning technologies demonstrate his expertise and innovative spirit. His patents reflect a commitment to advancing the field and improving substrate processing methods.