Haoxiang Fan

Title: Haoxiang Fan: Innovator in Quantum Dot Technology

Introduction

Haoxiang Fan is a prominent inventor based in Beijing, China. He has made significant contributions to the field of quantum dot technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and performance of electronic devices through innovative materials and designs.

Latest Patents

Among his latest patents, Haoxiang Fan has developed a quantum dot film, a quantum dot light-emitting assembly, and a display device. The quantum dot film includes a quantum dot layer and a conductive layer arranged on at least one side of the quantum dot layer. This conductive layer contains nano-sized metal particles, which are configured to generate surface plasmon resonance under electromagnetic radiation. This arrangement effectively improves the luminescence efficiency and intensity of the quantum dot layer. Additionally, he has patented an array substrate, a manufacturing method for it, and an electronic device. This array substrate features a base substrate with a switch element and a pixel electrode, which is electrically connected through a via hole.

Career Highlights

Haoxiang Fan has worked with notable companies in the technology sector, including Chongqing BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to apply his innovative ideas in practical applications, contributing to advancements in display technologies.

Collaborations

Throughout his career, Haoxiang has collaborated with talented individuals such as Xiaoji Li and Zhe Li. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Haoxiang Fan's contributions to quantum dot technology and his innovative patents highlight his role as a leading inventor in the field. His work continues to influence advancements in electronic devices and display technologies.