HaoMiao Chang

Title: HaoMiao Chang: Innovator in Metrology Technology

Introduction

HaoMiao Chang is a prominent inventor based in Milpitas, CA (US). He has made significant contributions to the field of metrology, particularly in the area of nanosheet surface roughness and profile inspection. His innovative work has led to the development of advanced inspection systems that enhance the accuracy and efficiency of measurements in various applications.

Latest Patents

HaoMiao Chang holds a patent for a groundbreaking invention titled "Metrology of Nanosheet Surface Roughness and Profile." This patent describes an inspection system that includes a controller with a memory maintaining program instructions and one or more processors configured to execute these instructions. The system generates a geometric model of a sample's structure and an optical response function model based on this geometric model. It also processes measured data from a detector to create a parametric sub-structure model, allowing for the extraction of critical parameters of the structure.

Career Highlights

HaoMiao Chang is currently employed at Kla Corporation, where he continues to push the boundaries of metrology technology. His work at Kla Corporation has positioned him as a key player in the development of innovative solutions that address complex measurement challenges in the semiconductor industry.

Collaborations

HaoMiao Chang collaborates with talented professionals in his field, including Houssam Chouaib and Teng Gu. These collaborations foster an environment of innovation and creativity, leading to the advancement of metrology technologies.

Conclusion

HaoMiao Chang's contributions to metrology and his innovative patent demonstrate his commitment to advancing technology in this critical field. His work at Kla Corporation and collaborations with other experts highlight his role as a leading inventor in the industry.