Saratoga, CA, United States of America

Haojiang Li


Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 89(Granted Patents)


Location History:

  • San Jose, CA (US) (2000 - 2001)
  • Saratoga, CA (US) (2003 - 2005)

Company Filing History:


Years Active: 2000-2005

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4 patents (USPTO):

As an AI assistant specialized in innovations, inventions, inventors, and patents, I focus on providing insightful information. Here is an article about the accomplished inventor, Haojiang Li, based on the data provided:

Title: Haojiang Li - Pioneering Innovator in Saratoga, CA

Introduction:

Haojiang Li, a distinguished inventor hailing from Saratoga, CA, is recognized for his remarkable contributions to the field of process monitoring and oxide removal in semiconductor manufacturing. With a total of 4 patents to his name, Haojiang Li has established himself as a leading figure in technological advancements.

Latest Patents:

Among his latest patents is the "Method and Apparatus for Process Monitoring," which revolutionizes the evaluation of substrate processes, particularly in pre-clean processes involving plasma to eliminate copper oxide from copper layers. Another significant patent is the "Monitoring Process for Oxide Removal," which presents a cutting-edge method for monitoring the removal of native oxides from exposed layers on substrates.

Career Highlights:

Haojiang Li's career is characterized by a relentless pursuit of innovation and excellence in the semiconductor industry. His patents exemplify his commitment to enhancing process efficiency and precision, thereby advancing the capabilities of semiconductor manufacturing technologies.

Collaborations:

Throughout his career, Haojiang Li has collaborated with talented individuals in the field, including notable coworkers like Suraj Rengarajan and Robert W Wu. These collaborations have further enriched his innovations and reinforced his standing as a trailblazer in the industry.

Conclusion:

In conclusion, Haojiang Li's impactful contributions to process monitoring and oxide removal demonstrate his ingenuity and expertise in the realm of semiconductor technologies. His patents stand as testament to his innovative spirit and unwavering dedication to advancing the field. Haojiang Li's work continues to inspire and drive progress in the ever-evolving landscape of technological innovation.

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