The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2005

Filed:

Jun. 26, 2002
Applicants:

Suraj Rengarajan, San Jose, CA (US);

Michael Wood, San Jose, CA (US);

Haojiang LI, Saratoga, CA (US);

Moshe Sarfaty, Cupertino, CA (US);

Kevin Song, Gardena, CA (US);

Inventors:

Suraj Rengarajan, San Jose, CA (US);

Michael Wood, San Jose, CA (US);

Haojiang Li, Saratoga, CA (US);

Moshe Sarfaty, Cupertino, CA (US);

Kevin Song, Gardena, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L023/58 ;
U.S. Cl.
CPC ...
Abstract

Embodiments of the invention provide an apparatus and method to determine the health of a substrate process such as, for example, a pre-clean process using plasma to remove copper oxide from a copper layer on a substrate, and the point at which the process has ended. In one aspect, optical characteristics and/or chamber impedance are used to determine the process end-point and/or process chamber health.


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