Taipei, Taiwan

Hao-Yu Lan


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2024

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4 patents (USPTO):Explore Patents

Title: Hao-Yu Lan: Innovator in Lithography Technology

Introduction

Hao-Yu Lan, based in Taipei, Taiwan, is an accomplished inventor with a remarkable portfolio of four patents. His work primarily revolves around advanced lithography systems, contributing significantly to the semiconductor manufacturing industry.

Latest Patents

Hao-Yu Lan's recent patents showcase innovative advancements in lithography technology. One notable patent details a lithography system and method that includes an exposing device capable of generating a real-time image featuring multiple first alignment marks of a mask. This system employs an adjusting device that fine-tunes the mask's offset from a predetermined position, ensuring it is within critical operational parameters. Another significant patent describes a cleaning and scanner device configuration. The cleaning device is designed to maintain the mask's integrity, while the scanner device facilitates the mapping of real-time and reference images during the lithography exposing process, optimizing accuracy and efficiency.

Career Highlights

Hao-Yu Lan is currently working with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in advanced semiconductor manufacturing. His contributions have played a vital role in enhancing lithography techniques, which are crucial for producing microprocessors and other complex electronic components.

Collaborations

Throughout his career, Hao-Yu Lan has collaborated with notable colleagues including Po-Chung Cheng and Ching-Juinn Huang. Together, they have leveraged their expertise to push the boundaries of existing technologies and develop innovative solutions in the field of semiconductor manufacturing.

Conclusion

Hao-Yu Lan exemplifies the spirit of innovation in the semiconductor industry through his brilliant patents and collaborations. His work not only enhances manufacturing processes but also paves the way for future advancements in lithography technology. With his continued commitment to innovation, he remains a significant figure in his field, contributing to the evolution of modern electronics.

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