Taoyuan, Taiwan

Hao-Pu Chang

This inventor holds 1 USPTO granted patent. Top assignee: Apaq Technology Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hao-Pu Chang. Retrieved from https://idiyas.com/inventor/hao-pu-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations by Hao-Pu Chang in Polymer Composite Materials

Introduction

Hao-Pu Chang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of polymer composite materials, particularly in their application to capacitor elements. His innovative methods have the potential to enhance the performance and efficiency of electronic components.

Latest Patents

Hao-Pu Chang holds a patent for a method for forming polymer composite material onto a capacitor element. This method involves several steps, including preparing a homogeneous reaction solution, allowing it to rest to generate microparticles, immersing the capacitor element into the solution, and finally polymerizing the material to form a composite layer. The process utilizes 3,4-ethylenedioxythiophene and polystyrene sulfonic acid, resulting in a highly effective polymer composite material.

Career Highlights

Chang is currently associated with Apaq Technology Co., Ltd., where he continues to develop innovative solutions in the field of materials science. His work focuses on improving the functionality and reliability of electronic components through advanced material applications.

Collaborations

Hao-Pu Chang collaborates with Chieh Lin, contributing to the advancement of technology in their field. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Hao-Pu Chang's contributions to polymer composite materials represent a significant advancement in the field of electronics. His innovative methods and collaborative efforts continue to pave the way for future developments in capacitor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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