This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Xi'an Eswin Material Technology Co., Ltd., Xi'an Eswin Silicon Wafer Technology Co., Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 14 
1 out of 9 Years Active: 2023
Title: Biography of Inventor Hao Pan
Introduction: Hao Pan is a notable inventor based in Xi'an, China. He has made significant contributions to the field of material technology, particularly in the area of silicon production.
Latest Patents: Hao Pan holds a patent for a "Method for regulating inert gas flow, method for preparing monocrystalline silicon, and monocrystalline silicon." This patent provides a method for regulating inert gas flow in a crystal pulling furnace, which includes introducing the inert gas into a main furnace chamber from an auxiliary furnace chamber and regulating the flow direction of the inert gas.
Career Highlights: Throughout his career, Hao Pan has worked with companies such as Xi'an Eswin Material Technology Co., Ltd. and Xi'an Eswin Silicon Wafer Technology Co., Ltd. His work has been instrumental in advancing the technology related to silicon wafers.
Collaborations: Hao Pan has collaborated with professionals in his field, including his coworker Hyunguk Jeon. These collaborations have contributed to the development of innovative solutions in material technology.
Conclusion: Hao Pan's contributions to the field of silicon production and material technology highlight his role as an influential inventor. His patent and collaborations reflect his commitment to advancing technology in this important area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile