Singapore, Singapore

Hao Gong

This inventor holds 2 USPTO granted patents. Top assignees: National University of Singapore, Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2000-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hao Gong. Retrieved from https://idiyas.com/inventor/hao-gong-beqqjzy7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2000-2004

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2 patents (USPTO):Explore Patents

Title: Hao Gong: Innovator in Semiconductor Technology

Introduction

Hao Gong is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. With a total of 2 patents, he has made significant advancements in the field, particularly in the development of transparent semiconductors and innovative imaging methods.

Latest Patents

One of Hao Gong's latest patents is for a P-type transparent copper-aluminum-oxide semiconductor. This invention provides a transparent Cu–Al–O semi-conducting film with a p-type conductivity greater than 0.95×10 S·cm. The process for preparing this film involves controllably vaporizing organo-copper and organo-aluminum precursors and carrying the vapors into a chemical vapor deposition chamber with an inert gas flow. The vapors are then reacted and deposited on a substrate, preferably a light-transmitting substrate, through a chemical vapor deposition process.

Another notable patent is a method and apparatus to image metallic patches embedded in a non-metal. This invention allows for the detection and mapping of small metallic patches embedded in a mainly non-metallic surface. By placing a wire coil at the free end of a cantilever, with a fine tip made of a ferro-magnetic material located at its center, and passing an alternating current through the coil, eddy currents are induced in the metallic patches. This creates a small magnetic moment that pulls the tip towards the surface, allowing for the mapping of the metallic patches.

Career Highlights

Hao Gong has worked with esteemed organizations such as the National University of Singapore and Chartered Semiconductor Manufacturing Ltd. His work in these institutions has contributed to his expertise and innovation in semiconductor technologies.

Collaborations

Throughout his career, Hao has collaborated with notable colleagues, including Cher Liang Cha and Lei Huang. These collaborations have further enhanced his research and development efforts in the field.

Conclusion

Hao Gong's innovative work in semiconductor technology, particularly in transparent materials and imaging methods, showcases his significant contributions to the field. His patents reflect a commitment to advancing technology and improving the capabilities of semiconductor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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