Hao-Chun Liang

Title: Hao-Chun Liang: Innovator in Semiconductor Technology

Introduction

Hao-Chun Liang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on developing advanced semiconductor devices and components that enhance performance and efficiency.

Latest Patents

One of Hao-Chun Liang's latest patents involves a semiconductor device and a semiconductor component. This invention includes an active structure, a ring-shaped semiconductor contact layer, a first electrode, and an insulating layer. The active structure consists of a first-conductivity-type semiconductor layer, a second-conductivity-type semiconductor layer, and an active layer situated between the two semiconductor layers. The ring-shaped semiconductor contact layer is positioned on the second-conductivity-type semiconductor layer and features a first inner sidewall and a first outer sidewall. The first electrode covers the ring-shaped semiconductor contact layer, while the insulating layer envelops both the first electrode and the active structure, having a second inner sidewall and a second outer sidewall. Notably, the first inner sidewall does not align vertically with the second inner sidewall.

Career Highlights

Hao-Chun Liang is currently associated with Epistar Corporation, a leading company in the semiconductor industry. His innovative work has positioned him as a key figure in the development of cutting-edge technologies.

Collaborations

Throughout his career, Hao-Chun Liang has collaborated with notable colleagues, including Yao-Ning Chan and Shih-Chang Lee. These partnerships have contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Hao-Chun Liang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.