Dresden, Germany

Hans Zeindl

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Zeindl. Retrieved from https://idiyas.com/inventor/hans-zeindl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations by Hans Zeindl in Semiconductor Fabrication

Introduction

Hans Zeindl is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for fabricating semiconductor devices.

Latest Patents

Hans Zeindl holds a patent for a method of fabricating semiconductor devices with contact studs formed without major polishing defects. This patent outlines a process where a contact stud is embedded in an insulating structure, which includes a first and a second insulating layer. The method involves several steps, including providing the first layer above the substrate, exposing a portion of the substrate to receive the stud, and applying chemical-mechanical polishing to ensure the integrity of the device.

Career Highlights

Throughout his career, Hans Zeindl has focused on advancing semiconductor fabrication techniques. His work has been instrumental in improving the reliability and performance of semiconductor devices. With a patent count of 1 patent, he continues to contribute to the field through innovative solutions.

Collaborations

Hans has collaborated with John George Maltabes, working together to enhance semiconductor technologies. Their partnership has fostered advancements in the industry.

Conclusion

Hans Zeindl's contributions to semiconductor fabrication highlight his innovative spirit and dedication to technology. His patented methods are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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