The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Apr. 30, 2001
John Maltabes, Austin, TX (US);
Hans Zeindl, Dresden, DE;
Other;
Abstract
In a semiconductor device, a contact stud ( ) contacts a semiconductor substrate ( ); the stud is embedded in an insulating structure with a first insulating layer ( ) and a second insulating layer ( ). During manufacturing, (a) the first layer ( ) is provided above the substrate ( ); (b) a hole in the first layer ( ) exposes a portion of the upper surface of the substrate to receive the stud; (c) a contact material ( ) is provided at the top of the resulting structure; (d) a first chemical-mechanical polishing (CMP) removes the contact material from the surface of the first layer ( ) outside the hole; (e) residuals ( ) of the contact material are cleaned away from the upper surface; (f) the second insulating layer ( ) is provided at the surface of the resulting structure; (g) and further polishing is applied.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile