Hedingen, Switzerland

Hans W Lehmann


Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 98(Granted Patents)


Location History:

  • Zurich, CH (1983)
  • Hedingen, CH (1978 - 1985)

Company Filing History:


Years Active: 1978-1985

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4 patents (USPTO):Explore Patents

Title: Innovations of Hans W. Lehmann

Introduction

Hans W. Lehmann is a notable inventor based in Hedingen, Switzerland. He has made significant contributions to the field of technology, particularly in the development of advanced dielectric-layer filter systems. With a total of four patents to his name, Lehmann's work showcases his innovative spirit and technical expertise.

Latest Patents

Lehmann's latest patents include a "Standardized multi-stack dielectric-layer filter blank and method for a green-manifesting blank." This invention involves a unique combination of yellow and cyan dielectric stacks supported by a transparent substrate. It allows for the fabrication of color-encoding filters with arbitrary spatial patterns through a combination of dry-etching and wet etching techniques. Additionally, he has developed a patent for "Reactive sputter etching of aluminum," which features an improved sputter etching apparatus utilizing a cryogenic pump for enhanced efficiency in etching aluminum substrates with reactive gases.

Career Highlights

Throughout his career, Lehmann has demonstrated a commitment to innovation and excellence in his field. His work has not only advanced the technology of dielectric filters but has also contributed to the efficiency of sputter etching processes.

Collaborations

Lehmann has collaborated with notable colleagues, including Roland W. Widmer and Michael T. Gale, further enhancing the impact of his inventions through teamwork and shared expertise.

Conclusion

Hans W. Lehmann's contributions to technology through his patents reflect his innovative mindset and dedication to advancing the field. His work continues to influence the development of new technologies in the industry.

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