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For the Inventor, By the Inventor

Aachen, Germany

Hans Rau

This inventor holds 5 USPTO granted patents. Top assignee: U.S. Philips Corporation. Active years: 1976-1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Rau. Retrieved from https://idiyas.com/inventor/hans-rau-fpxos645

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 1.9

ph-index = 4

Forward Citations = 115(Granted Patents)


Location History:

  • Aachen-Laurensberg, DE (1976)
  • Aachen, DE (1989 - 1990)

Company Filing History:

goldMedal5 out of 14,087 
 
U.S. Philips Corporation
 patents

Years Active: 1976-1990

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5 patents (USPTO):Explore Patents
1. 4947790 - Arrangement for producing a gas flow which is enriched with the vapor of (1990-08-14),
2. 4883362 - Device for enriching a carrier gas with the vapor of a sparingly (1989-11-28),
3. 4877938 - Plasma activated deposition of an insulating material on the interior of (1989-10-31),
4. 4842839 - Process for the removal of hydrogen from hydrogen compounds dissolved in (1989-06-27),
5. 3967986 - Method of preparing ferromagnetic material (1976-07-06),

Title: Innovations of Hans Rau in Gas Flow Enrichment

Introduction

Hans Rau is a notable inventor based in Aachen, Germany. He has made significant contributions to the field of gas flow enrichment, particularly in the production of gas flows enriched with low-volatile materials. With a total of 5 patents to his name, Rau's work has implications in various industrial applications.

Latest Patents

Rau's latest patents include an arrangement for producing a gas flow enriched with the vapor of a low-volatile material. This innovative arrangement features a vessel designed to hold a powder bed consisting of a low-volatile material and an additional solid inert component. The vessel is placed in a thermostatically controlled bath, allowing an inert gas to flow through the arrangement. This design ensures a high mass flow of low-volatile material, which can be directed to a low-pressure CVD reactor. Another significant patent is a device for enriching a carrier gas with the vapor of a sparingly volatile material. This device includes a removable tightly fitting metal body with a coiled groove that holds the sparingly volatile material. The design prevents the carrier gas from escaping, ensuring a defined mass flow of materials used for chemical deposition from the gaseous phase.

Career Highlights

Hans Rau has had a distinguished career, working with U.S. Philips Corporation, where he has been able to apply his innovative ideas in practical settings. His work has not only advanced the technology in gas flow enrichment but has also contributed to the broader field of chemical engineering.

Collaborations

Rau has collaborated with notable colleagues such as Georg Friedrich Gartner and Peter A Janiel. These collaborations have likely enhanced the development and implementation of his innovative technologies.

Conclusion

Hans Rau's contributions to gas flow enrichment through his innovative patents demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence industrial applications and chemical processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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