U.S. Philips Corporation

Hans Rau

Georg Friedrich Gartner

Peter A Janiel

Petrus F De Jongh

Karl-Georg Knauff

An arrangement for producing a gas flow which is enriched with the vapor of a low-volatile material. The arrangement comprises a vessel (1) having an interior space (12) for holding a powder bed (13), which consists of a low-volatile material and an additional solid inert component. The vessel is arranged in a thermostatically controlled bath (2). A gas flow (4, 16) consisting of an inert gas flows through the arrangement, preferably in the direction of the gravitational force. The gas flow passes, in this sequence, through a thick gas inlet plate (10), the powder bed (13) and a thin gas outlet plate (14). By proper dimensioning the component parts of the arrangement and providing a low pressure in the arrangement a high mass flow of the low-volatile material with a flow constant of a long duration is achieved. The enriched gas flow is conducted, for example, to a low-pressure CVD reactor.

Arrangement for producing a gas flow which is enriched with the vapor of

An enriching device consisting of a container which comprises a removable tightly fitting metal body the sparingly volatile material being present in a coiled groove. During operation of this device transverse flows and shortcuts, respectively, of the carrier gas flow occur. To assure that the carrier gas flows through the material without having an escape possibility, the groove (5) is made either in an outer wall of the metal body (8) or in the bottom (4) of the container (1), and the parts (6) present between the individual turns of the groove have a cutting edge, i.e. a cross-sectional profile in the form of a wedge, the tip of which is in contact either with the smooth inner wall of the container (1) or with the smooth lower side of the metal body (8). The device is suitable for adjusting a defined mass flow of sparingly volatile materials which are used as starting compounds for chemical deposition from the gaseous phase.

Device for enriching a carrier gas with the vapor of a sparingly

In the internal coating of a tube of an electrically insulating material by a second electrically insulating material by reactive deposition of the second electrically insulating material from a gas mixture which is passed through the tube, the desposition is activated by a plasma which is produced by microwaves and is reciprocated in the tube. A method with low energy consumption and a device of a simple construction are made possible in that the plasma is excited by TE 011 resonance in a cylindrical resonator.

Plasma activated deposition of an insulating material on the interior of

By a chlorination process at a temperature exceeding 1000.degree. C. all hydrogenous compounds, including organic compounds, are converted into hydrogen-free compounds, e.g. CCl.sub.4, which do not interfere in the manufacture of optical fibres.

Process for the removal of hydrogen from hydrogen compounds dissolved in

A method of preparing iron powder for recording in which iron oxide hydrate powder is reduced by flowing hydrogen in intimate contact with the iron oxide hydrate powder, preferrably in a fluidized bed.

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Aachen, Germany

Hans Rau