Company Filing History:
2 out of 29 
1 out of 2 
1 out of 10 Years Active: 2005-2016
- Title: Hans Löschner: Innovator Extraordinaire in Charged-Particle Multi-Beam Technology
- Introduction: Hans Löschner, a distinguished innovator based in Vienna, AT, has made significant contributions to the field of charged-particle multi-beam technology. With a remarkable track record of achievements and a portfolio of patents, he has propelled advancements in the field and received recognition for his innovative work. This article delves into his latest patents, career highlights, collaborations, and the profound impact of his contributions.
- Latest Patents: Among Hans Löschner's recent patents, two breakthrough inventions stand out:
1. Multi-beam tool for cutting patterns: This patent describes a charged-particle multi-beam processing apparatus capable of exposing a target with multiple parallel particle-optical columns. Each column is equipped with a beam shaping device that transforms the illuminating beam into a desired pattern composed of several sub-beams. An aperture array device, utilizing an array of apertures, shapes each sub-beam, while a deflection array device selectively deflects non-selected sub-beams from reaching the target. The design also incorporates field-boundary devices to accommodate feeding lines for controlling the deflection array device.
2. Multi-beam deflector array device for maskless particle-beam processing: This patent introduces a plate-like multi-beam deflector array device for particle-beam exposure apparatuses utilizing charged particles. The device features a membrane region with an array of apertures, corresponding to beamlets formed from the particle beam. Each aperture associates with an electrode placed within a depression, ensuring control over deflecting and non-deflecting states. This configuration enables particles to follow desired paths or be deflected from them, offering significant versatility in maskless particle-beam processing.
- Career Highlights: Throughout his illustrious career, Hans Löschner has achieved several milestones and received recognition for his groundbreaking work. His contributions to charged-particle multi-beam technology have reshaped the field and paved the way for future advancements. Notable highlights include:
1. Innovations at Ims Nanofabrication AG: Löschner made significant contributions during his tenure at Ims Nanofabrication AG, a renowned company specializing in groundbreaking nanofabrication technologies. His work in multi-beam processing apparatuses and deflector array devices garnered attention for its ingenuity and potential applications.
2. Research at Institut für Mikroelektronik: Löschner's collaboration with the prestigious Institut für Mikroelektronik further solidified his reputation as a leading figure in the field. His research endeavors encompassed cutting-edge technologies, pushing the boundaries of particle-beam processing and deflection.
- Collaborations: Hans Löschner has collaborated with notable figures in the industry, fostering a rich network of innovators and experts. Two of his prominent coworkers include:
1. Elmar Platzgummer: Working alongside Elmar Platzgummer, an accomplished professional with expertise in nanofabrication, Löschner has thrived in developing cutting-edge technologies. Their collaboration has resulted in exciting advancements in multi-beam processing and deflection systems.
2. Gerhard Stengl: Gerhard Stengl, another esteemed expert in the field, has joined forces with Löschner to explore new frontiers in charged-particle multi-beam technology. Together, they have contributed to the development of novel deflector array devices and particle-beam processing techniques.
- Conclusion: Hans Löschner's unwavering dedication to innovating in charged-particle multi-beam technology has solidified his position as a leading figure in the field. With an impressive array of patents and collaborations, his work continues to reshape industries dependent on nanofabrication and particle-beam processing. By pushing the boundaries of what is possible in multi-beam technologies, Löschner's contributions will undoubtedly inspire future advancements and further cement his legacy as an exceptional innovator in the field.