Location History:
- Tiesen, LI (1981)
- Triesen, LI (1979 - 2004)
Company Filing History:
2 out of 173 
1 out of 23 
1 out of 14 Years Active: 1979-2004
Title: The Innovations of Hans K Pulker
Introduction
Hans K Pulker, an accomplished inventor located in Triesen, Liechtenstein, holds an impressive portfolio of five patents. His contributions to the field of thin film deposition and reactive vapor deposition demonstrate his commitment to advancing material science and engineering applications.
Latest Patents
Pulker's latest innovations include groundbreaking methods for thin film deposition. One such patent focuses on a method of thin film deposition under reactive conditions utilizing RF or pulsed DC plasma at the substrate holder. This technique enables the creation of optical coatings that exhibit negligible optical absorption, high quality, and low cost, even on unheated substrates. The use of RF/pulsed DC bias generates a plasma in front of the substrate, enhancing the reactivity of the gas present and facilitating the appropriate stoichiometry of the deposited film. Additionally, this method incorporates energetic ion bombardment during film growth, improving both adherence and the compactness of the deposit.
Another significant patent involves a method and apparatus for the reactive vapor deposition of various layers such as oxides, nitrides, oxynitrides, and carbides through ion plating. This innovative approach keeps the surface to be coated electrically insulated during the process, while maintaining an electric plasma that results in the formation of hard and firmly adhering layers. The ion incidence density on the substrate ranges from 0.5 to 2 mA per cm², with the surface charging to a potential of -5 to -60 volts.
Career Highlights
Throughout his career, Pulker has worked with notable companies, including Balzers Aktiengesellschaft and Balzers Patent-und Beteiligungs-aktiengesellschaft. His experience in these organizations has enriched his expertise and has been pivotal in developing his patents.
Collaborations
Hans K Pulker has collaborated with esteemed colleagues in his field, including Helmut Daxinger and Reinhard Staffler. These partnerships have contributed to the success of his innovative endeavors and have enhanced the impact of his work on the scientific community.
Conclusion
With his five patents and significant contributions to the field of thin film deposition and reactive vapor deposition, Hans K Pulker stands out as a prominent inventor. His work not only pushes the boundaries of material science but also impacts industries seeking advanced coating solutions. Through collaboration and innovation, Pulker continues to make strides that benefit both the scientific community and practical applications in various fields.