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Balzers Aktiengesellschaft Fur Hochvakuumtechnik Und Dunne Schichten

Hans K Pulker

Helmut Daxinger

Walter Haag

Carlo Misiano

Eberhard Moll

Reinhard Staffler

Method of thin film deposition especially in reactive conditions. Optical coatings with negligible optical absorption, of high quality and low cost even on unheated substrates are deposited using an RF/pulsed DC plasma RF/pulsed DC bias generates a plasma in front of the substrate. This plasma allows obtaining the right stoichiometry of the deposited film by increasing the reactivity of the reactive gas present in the plasma and, in addition, introduces an energetic ion bombardment of the substrate before and during the growth of the film which improves the adherence and the deposit compactness.

Method of thin film deposition under reactive conditions with RF or pulsed DC plasma at the substrate holder

For the vapor deposition of layers of oxides, nitrides, oxynitrides and carbides by ion plating, the surface to be coated is electrically insulated or mounted under insulation and during the coating an electric plasma is maintained in front of the surface to be coated, in such a way that the ion incidence density on the substrate is 0.5 to 2 mA per cm.sup.2 and the surface charges to a potential of -5 to -60 volts. Thereby especially hard and firmly adhering layers are obtained.

Method and apparatus for the reactive vapor deposition of layers of

A method of controlling color hues of coatings particularly gold color coatings on substrate using a housing capable of being evacuated, and having an evacuated chamber, a hot cathode chamber in communication with the evacuated chamber and a support structure for the substrate to be coated and a crucible for the material to be evaporated acting as an anode and with a hot cathode in the hot cathode chamber, comprises evaporating the material in the evaporation chamber while maintaining a residual gas atmosphere containing nitrogen therein, producing an electric gas arc discharge between the cathode and the anode of a low voltage, and mixing a carbon containing gaseous compound to the residual gas while applying a negative biasing voltage relative to the housing to the substrate to be coated.

Method for producing gold color coatings

A method of producing gold-color coatings on substrates by evaporating a coating material comprising a metallic titanium or zirconium in a housing which has walls which define an evaporation space, comprises, maintaining a vacuum atmosphere containing N.sub.2 and argon in the space. The method is carried out using an anode connected to a power source to produce a low voltage arc discharge in the vicinity of the coating material which is arranged within the evaporation space and also maintaining a low voltage arc between the anode and the substrates. A potential difference between the anode and the substrates of a range of between 5 v and 100 v are maintained during the process and, in addition, the electrical potential of the substrates is maintained between 0 and 150 volts lower than the potential of the housing walls which define the evaporation space. The substrate to be coated is coated at a rate of from between 1 to 15 nanometers per second. The N.sub.2 and argon atmosphere is maintained so that a partial pressure of the N.sub.2 -containing component ranges between 2.times.10.sup.-4 and 10.sup.-2 millbar. The potential difference between the anode and the substrates is reduced in the course of the process to release the sputtering threshold of the substrate and the housing wall. The partial pressure of the N.sub.2 -containing components continuously increase in the course of the process.

Method of producing gold-color coatings

A method for producing carbon coatings by sputtering comprises placing the target material to be sputtered which is made of a fibrous carbon material such as paper, velvet, wood, etc. which has been charred on the cathode. The apparatus comprises an electrode forming an anode which is arranged in spaced relationship to a cathode.

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Triesen, Liechtenstein

Hans K Pulker