Location History:
- Stuttgart, DE (1985 - 1986)
- Bernhausen, DE (1991)
- Filderstadt, DE (1989 - 1992)
Company Filing History:
Years Active: 1985-1992
Title: Innovations and Contributions of Hans-Joachim Trumpp
Introduction
Hans-Joachim Trumpp is a notable inventor based in Filderstadt, Germany. He has made significant contributions to the field of integrated circuit technology. With a total of 7 patents to his name, Trumpp has demonstrated a commitment to advancing technological innovation.
Latest Patents
Trumpp's latest patents include a method for producing an integrated circuit structure with a dense multilayer metallization pattern. This method involves manufacturing a high-density multilayer metallization pattern on an integrated circuit structure. The process includes forming a first metallization pattern on a semiconductor substrate, applying a double-layer insulation, and utilizing reactive ion etching for planarization. Another significant patent focuses on a process for making masks with structures in the submicron range. This process involves creating structures of photoresist or polymer material on a silicon substrate, followed by the deposition of silicon nitride and various etching steps to achieve precise dimensions.
Career Highlights
Trumpp is currently associated with International Business Machines Corporation (IBM), where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of integrated circuits.
Collaborations
Throughout his career, Trumpp has collaborated with esteemed colleagues such as Otto Koblinger and Reinhold Muhl. These collaborations have further enriched his contributions to the field.
Conclusion
Hans-Joachim Trumpp's innovative work and patents have significantly impacted the realm of integrated circuit technology. His dedication to advancing this field is evident through his numerous contributions and collaborations.