Oberkochen, Germany

Hans-Joachim Miesner


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hans-Joachim Miesner

Introduction

Hans-Joachim Miesner is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of micro-lithography through his innovative designs and patents. His work has had a profound impact on the technology used in projection exposure devices.

Latest Patents

Miesner holds a patent for a projection exposure device, which is particularly designed for micro-lithography. This device is engineered to produce an image of an object in an image plane positioned in an object plane. The projection exposure device includes a radiation source that emits projection radiation. Illumination optics are strategically placed between the radiation source and the object plane, while projection optics are located between the object plane and the image plane. Additionally, a detection device is incorporated to measure the illumination angle distribution of the projection radiation in a field plane. This system communicates with at least one control device, which interacts with a manipulator to move at least one optical component within the projection ray path. The illumination angle distribution can be adjusted based on the controlled movement of the optical component, allowing for adaptation to the object structure.

Career Highlights

Miesner is associated with Carl Zeiss Stiftung, a prominent company known for its advancements in optical systems and technologies. His work at this institution has allowed him to further develop his innovative ideas and contribute to the field of micro-lithography.

Collaborations

Throughout his career, Miesner has collaborated with talented individuals such as Ulrich Drodofsky and Nils Dieckmann. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Hans-Joachim Miesner's contributions to the field of micro-lithography through his patent for a projection exposure device exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

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