The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Sep. 19, 2001
Ulrich Drodofsky, Oberkochen, DE;
Nils Dieckmann, Aalen, DE;
Martin Antoni, Aalen, DE;
Hans-Joachim Miesner, Oberkochen, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
A projection exposure device ( ), in particular for micro-lithography, serves to produce an image of an object ( ) in an image plane ( ) positioned in an object plane ( ). For this reason the projection exposure device ( ) has a radiation source ( ) emitting projection radiation ( ). Illumination optics ( ) are positioned between the radiation source ( ) and the object plane ( ) and projection optics ( ) are positioned between the object plane ( ) and the image plane ( ). A detection device ( ) is provided to measure the illumination angle distribution of the projection radiation ( ) in a field plane ( ). This communicates via at least one control device ( ) with at least one manipulator ( ). The latter serves to move at least one optical component ( ) within the projection ray path ( ). The illumination angle distribution changes as a result of the controlled movement of the optical component ( ). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure.