Company Filing History:
Years Active: 2003
Title: Ulrich Drodofsky: Innovator in Projection Exposure Technology
Introduction
Ulrich Drodofsky is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of micro-lithography through his innovative designs and patents. His work primarily focuses on projection exposure devices, which are essential in producing high-quality images for various applications.
Latest Patents
Drodofsky holds a patent for a projection exposure device. This device is designed to produce an image of an object in an image plane positioned in an object plane. It features a radiation source that emits projection radiation, with illumination optics placed between the radiation source and the object plane. Additionally, projection optics are situated between the object plane and the image plane. A detection device is included to measure the illumination angle distribution of the projection radiation in a field plane. This system communicates with at least one control device, which interacts with a manipulator to move optical components within the projection ray path. The illumination angle distribution can be adjusted based on measurement results, allowing for adaptation to the object structure.
Career Highlights
Drodofsky's career is marked by his association with Carl Zeiss Stiftung, a prominent organization in the optics and imaging sector. His work has been instrumental in advancing technologies that enhance the precision and efficiency of micro-lithography processes.
Collaborations
Throughout his career, Drodofsky has collaborated with talented individuals such as Nils Dieckmann and Martin Antoni. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.
Conclusion
Ulrich Drodofsky's contributions to projection exposure technology highlight his role as a key innovator in the field of micro-lithography. His patent and collaborative efforts continue to influence advancements in imaging technologies.