Carl-zeiss-stiftung

Hans-Joachim Miesner

Martin Antoni

Nils Dieckmann

Ulrich Drodofsky

A projection exposure device ( ), in particular for micro-lithography, serves to produce an image of an object ( ) in an image plane ( ) positioned in an object plane ( ). For this reason the projection exposure device ( ) has a radiation source ( ) emitting projection radiation ( ). Illumination optics ( ) are positioned between the radiation source ( ) and the object plane ( ) and projection optics ( ) are positioned between the object plane ( ) and the image plane ( ). A detection device ( ) is provided to measure the illumination angle distribution of the projection radiation ( ) in a field plane ( ). This communicates via at least one control device ( ) with at least one manipulator ( ). The latter serves to move at least one optical component ( ) within the projection ray path ( ). The illumination angle distribution changes as a result of the controlled movement of the optical component ( ). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure.

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Oberkochen, Germany

Hans-Joachim Miesner