Company Filing History:
Years Active: 2006-2008
Title: **Inventor Hans-Georg Froehlich: Innovating Photolithography Techniques**
Introduction
Hans-Georg Froehlich, a notable inventor from Dresden, Germany, has made significant contributions to the field of photolithography through his innovative methods aimed at improving measurement accuracy in semiconductor fabrication. With three patents to his name, Froehlich has showcased his expertise and commitment to advancing technology.
Latest Patents
Froehlich's latest patents include:
1. **Method for Reducing an Overlay Error and Measurement Mark for Carrying Out the Same** - This patent describes a method for reducing an overlay error of structured layers relative to a reference layer. It involves the formation of standard measurement marks to determine overlay errors and set up further measurement marks to identify additional optical imaging errors affecting circuit patterns.
2. **Method for Correcting Structure-Size-Dependent Positioning Errors in Photolithography** - This innovative method addresses the challenges of positioning errors that depend on structure sizes during the photolithographic process. It outlines a comprehensive approach including simulation models, correction functions, and the calculations necessary for improving the accuracy of exposures during semiconductor manufacturing.
Career Highlights
Hans-Georg Froehlich currently works at Infineon Technologies AG, a global leader in semiconductor solutions. His work focuses on providing enhancements in the photolithography process, significantly contributing to the efficiency and precision required in modern chip manufacturing.
Collaborations
Throughout his career, Froehlich has collaborated with esteemed colleagues in his field, including Stefan Gruss and Ansgar Teipel. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, which is essential for advancing technology in the semiconductor industry.
Conclusion
Hans-Georg Froehlich is a prominent figure in the realm of photolithography, whose inventions continue to push the boundaries of semiconductor technology. His contributions not only enhance manufacturing precision but also ensure the ongoing evolution of innovative practices within the industry. As technology evolves, Froehlich’s work will undoubtedly remain influential in shaping future advancements in semiconductor fabrication.