The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Sep. 29, 2004
Lothar Bauch, Dresden, DE;
Stefan Gruss, Dresden, DE;
Ansgar Teipel, Dresden, DE;
Hans-georg Froehlich, Dresden, DE;
Lothar Bauch, Dresden, DE;
Stefan Gruss, Dresden, DE;
Ansgar Teipel, Dresden, DE;
Hans-Georg Froehlich, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A method, suitable to photolithographie projection, for detecting the positioning errors of circuit patterns during the transfer by a mask into layers of a substrate of a semiconductor wafer. After the transfer of at least one multiple arrangement of a first test structure into at least one resist layer above the substrate, wherein the first test structure includes a first circuit pattern, at least one first overlay mark and at least one first micropatterned alignment mark, the values of a first positioning error of the first circuit patterns relative to the first overlay marks and the first micropatterned alignment marks are determined for each element of the at least one multiple arrangement.