This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2006-2007.
Company Filing History:
Years Active: 2006-2007
Title: Ansgar Teipel: Innovator in Photolithography
Introduction
Ansgar Teipel is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of photolithography, particularly in methods that enhance the precision of semiconductor manufacturing. With a total of 2 patents, his work is recognized for its innovative approaches to solving complex positioning errors in photolithographic processes.
Latest Patents
Teipel's latest patents include a method for correcting structure-size-dependent positioning errors in photolithography. This method involves providing an exposure apparatus for exposing multiple exposure fields and utilizing a simulation model to specify correction values for intra-field errors. It also includes the determination of average relative positioning errors and the calculation of correction values to improve overlay in subsequent exposures. Another significant patent focuses on detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer. This method is designed to accurately determine positioning errors relative to overlay marks and alignment marks, ensuring high precision in semiconductor fabrication.
Career Highlights
Ansgar Teipel is currently associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has been pivotal in advancing the technology used in photolithography, contributing to the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Teipel has collaborated with esteemed colleagues such as Hans-Georg Froehlich and Lothar Bauch. These collaborations have further enriched his research and development efforts in the field of photolithography.
Conclusion
Ansgar Teipel's innovative contributions to photolithography exemplify the importance of precision in semiconductor manufacturing. His patents reflect a deep understanding of the challenges in the field and offer practical solutions that enhance the overall efficiency of the processes involved.