Hanno Heiβe

Title: Hanno Heiβe: Innovator in Reflection-Reducing Layer Systems

Introduction

Hanno Heiβe is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optical engineering, particularly in the development of methods for producing reflection-reducing layer systems. His innovative approach has implications for various applications, enhancing the performance of optical devices.

Latest Patents

Hanno Heiβe holds a patent for a "Method for producing a reflection-reducing layer system and reflection-reducing layer system." This patent describes a method that involves depositing a refractive index gradient layer on a substrate through the co-evaporation of inorganic and organic materials. The refractive index gradient layer is designed to decrease in a growth direction. Additionally, an organic layer is deposited above this gradient layer, and a nanostructure is produced in the organic layer using a plasma etching process. This innovative method aims to improve the efficiency of optical systems by minimizing reflection.

Career Highlights

Hanno Heiβe is associated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., a leading research organization in Germany. His work at this institution has allowed him to collaborate with other experts in the field and contribute to advancements in optical technologies.

Collaborations

Throughout his career, Hanno has worked alongside notable colleagues such as Ulrike Schulz and Friedrich Rickelt. These collaborations have fostered a productive environment for innovation and research, leading to significant advancements in their respective fields.

Conclusion

Hanno Heiβe's contributions to the development of reflection-reducing layer systems highlight his role as an influential inventor in optical engineering. His innovative methods and collaborations continue to impact the field positively.