Seoul, South Korea

Haksung Kim

This inventor holds 1 USPTO granted patent. Top assignees: Industry-University Cooperation Foundation Hanyang University, Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haksung Kim. Retrieved from https://idiyas.com/inventor/haksung-kim-9kwqh0uo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Haksung Kim: Innovator in Polymer Measurement Technology

Introduction

Haksung Kim is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of polymer measurement technology. His innovative work has led to the development of a unique apparatus designed to measure the properties of thermosetting polymers.

Latest Patents

Haksung Kim holds a patent for an "Apparatus and method for measuring properties of polymer." This apparatus includes a body with two chambers filled with thermosetting polymer material. It features first and second FBG sensors in each chamber, along with dielectric constant sensors. The computing device measures the properties of the polymer based on wavelength data and loss coefficients while the polymer solidifies.

Career Highlights

Throughout his career, Haksung Kim has worked with prominent organizations, including Samsung Electronics Ltd. and the Industry-University Cooperation Foundation at Hanyang University. His experience in these companies has enriched his expertise in polymer technology and innovation.

Collaborations

Haksung Kim has collaborated with notable colleagues such as Hansung Ryu and Gyunghwan Oh. Their joint efforts have contributed to advancements in the field of polymer measurement.

Conclusion

Haksung Kim's innovative work in polymer measurement technology showcases his dedication to advancing the field. His patent and collaborations reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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