Hakseok Lee

Title: Hakseok Lee: Innovator in Extreme Ultraviolet Technology

Introduction

Hakseok Lee is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) technology, which is crucial for advanced lithography in semiconductor manufacturing.

Latest Patents

Hakseok Lee holds a patent for an "Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system." This innovative apparatus includes a raw material supply unit that provides a plasma source for generating EUV light. The EUV light source unit utilizes a laser to create plasma from the plasma source. Additionally, a filter is designed to extract EUV light from the generated light. The apparatus features a first protective layer on the front surface of the filter, along with a frame that exposes a portion of the filter or the protective layer. The dimensions of the first region are smaller than those of the first protective layer and the filter.

Career Highlights

Throughout his career, Hakseok Lee has worked with notable organizations, including Samsung Electronics Co., Ltd. and Sungkyunkwan University. His work has been instrumental in advancing EUV technology, which plays a vital role in the production of smaller and more efficient semiconductor devices.

Collaborations

Hakseok Lee has collaborated with esteemed colleagues such as Jihoon Na and Mun Ja Kim. Their combined expertise has contributed to the development of innovative solutions in the field of EUV technology.

Conclusion

Hakseok Lee's contributions to extreme ultraviolet technology and his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the future of technology and manufacturing processes.